Published September 1, 2019 | Version v1
Journal article

Deep levels analysis in wavelength extended InGaAsBi photodetector

  • 1. Optoelectronic Device Laboratory, School of Information Science and Technology, Shanghai Tech University, Shanghai 201210 (China)
  • 2. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050 (China)
  • 3. National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, 200083 Shanghai (China)

Description

InP based dilute bismide InGaAsBi material is emerging as a promising candidate for extending short wavelength infrared detection. One critical factor to limit the performance of these InGaAsBi photodiodes is dark current caused by defects within the material. In this work, low frequency noise spectroscopy (LFNS) and temperature varied photoluminescence was used to characterize the defect levels in the devices. Three deep levels located at Ec − 0.33 eV, Ev + 0.14 eV, and Ec − 0.51 eV were identified from the LFNS spectra, which are consistent with emission peak energy found by photoluminescence spectra of InGaAsBi. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6641/ab3539

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
34
Journal Issue
9
Journal Page Range
[7 p.]
ISSN
0268-1242
CODEN
SSTEET