Published June 1994 | Version v1
Journal article

Colloid formation in copper-implanted fused silica and silicate glasses

  • 1. Dipartimento di Fisica, via Marzolo 8, 35131 Padova (Italy)
  • 2. Dipartimento di Ingegneria Elettrica, via Gradenigo 6, 35131 Padova (Italy)
  • 3. EniChem, via Della Chimica 5, 30175 Porto Marghera (Italy)
  • 4. Dipartimento di Chimica Organica, Metallorganica ed Analitica, via Loredan 4, 35131 Padova (Italy)
  • 5. Dipartimento di Chimica Fisica, Calle Larga S. Marta 2137, 30123 Venezia (Italy)
  • 6. Sandia National Laboratories, Department 1111, P.O. Box 5800, Albuquerque, NM 87185 (United States)

Description

Copper implantations (90 keV, 5x1016 ions/cm2) were made into fused silica, borosilicate glasses and soda-lime glass. The copper distribution has been found to vary according to glass type. The optical absorption band characteristic of the implanted metal optical properties was observed only for copper-implanted fused silica. The absorption for all the other samples was either not observable or was negligibly small, however very small metallic particles are present also in the soda-lime glass. A subsequent nitrogen implantation (100 keV, 1.5x1017 ions/cm2) completely eliminated the copper-colloid induced absorption in the copper-implanted fused silica, while it facilitated the formation of copper-colloids into the soda-lime glass. ((orig.))

Additional details

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
91
Journal Issue
1-4
Journal Page Range
p. 505-509.
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
7. international conference on radiation effects in insulators (REI-7).
Dates
6-10 Sep 1993.
Place
Nagoya (Japan).