Published January 7, 2009 | Version v1
Journal article

Fabrication and properties of silicon-based (Bi,Sm)4Ti3O12 thin film

  • 1. School of Materials Science and Engineering, University of Jinan, Jinan 250022 (China)
  • 2. State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100 (China)

Description

Ferroelectric Bi3.5Sm0.5Ti3O12 (BST) thin film has been grown on n-type Si (1 0 0) substrate by chemical solution deposition and spin coating technique. X-ray diffraction and atomic force microscope analyses confirmed that the film crystallized well at 700 deg. C. Metal-ferroelectric-semiconductor (MFS) configuration has been fabricated using BST as ferroelectric layer. The electrical measurements were conducted in MFS capacitor. The current-voltage characteristic displayed good insulating properties. Apparent counterclockwise hysteresis of capacitance-voltage curve for this film as the ferroelectric hysteresis was observed. The measurements of dielectric constant and dissipation factor as a function of frequency exhibited excellent dielectric properties. The MFS structure can be valuable for ferroelectric-gate field effect transistor

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jallcom.2007.12.059

Additional details

Identifiers

DOI
10.1016/j.jallcom.2007.12.059;
PII
S0925-8388(07)02287-6;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
467
Journal Issue
1-2
Journal Page Range
p. 434-437
ISSN
0925-8388
CODEN
JALCEU

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.