Published January 31, 2005 | Version v1
Journal article

Preparation and microstructures of FeSiBNbCu thin films

  • 1. Nano-Center, Department of Physics, East China Normal University, Shanghai 200062 (China)

Description

We have prepared FeSiBNbCu thin films by radio frequency (RF) magnetron sputtering and investigated the influence of the sputtering power on the microstructures of FeSiBNbCu thin films through analyzing their microstructural configurations by X-ray diffraction (XRD) and Mossbauer spectroscopy. The results showed that FeSiBNbCu thin films were amorphous when deposited with low sputtering power density and exhibited the mixed structure of crystalline and amorphous components with increasing the sputtering power density, without any heat treatment. The crystallites contained nanosized α-Fe(Si) and α-Fe(B) solid solutions of which the volume fractions and the microstructural configurations changed with the sputtering power

Additional details

Identifiers

DOI
10.1016/j.physb.2004.10.098;
PII
S0921-4526(04)01111-1;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
355
Journal Issue
1-4
Journal Page Range
p. 182-187
ISSN
0921-4526
CODEN
PHYBE3

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.