Published May 21, 2007 | Version v1
Journal article Metadata-only

E-beam lithography and electrodeposition fabrication of thick nanostructured devices

Creators

  • 1. Institute of Physics, Academia Sinica, Taipei 115, Taiwan (China)
  • 2. National Synchrotron Radiation Research Center, Hsinchu 300, Taiwan (China)
  • 3. X-ray Imaging Center, Pohang University of Science and Technology, Pohang (Korea, Republic of)
  • 4. Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne (Switzerland)

Description

A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (∼40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices

Additional details

Identifiers

DOI
10.1088/0022-3727/40/10/021;
PII
S0022-3727(07)42957-6;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
40
Journal Issue
10
Journal Page Range
p. 3172-3176
ISSN
0022-3727
CODEN
JPAPBE

Conference

Title
Symposium P - Nanoscale magnets: Synthesis, self-assembly, properties and applications
Acronym
Fall 2006 meeting of the Materials Research Society
Dates
27 Nov - 1 Dec 2006
Place
Boston, MA (United States)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38083519
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ASPECT RATIO; ELECTRODEPOSITION; ELECTRON BEAMS; EQUIPMENT; FABRICATION; HARD X RADIATION; LINE WIDTHS; NANOSTRUCTURES; PLATES; RESOLUTION
Descriptors DEC
BEAMS; DEPOSITION; DIMENSIONLESS NUMBERS; ELECTROLYSIS; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; LEPTON BEAMS; LYSIS; PARTICLE BEAMS; RADIATIONS; SURFACE COATING; X RADIATION