Published April 2016
| Version v1
Journal article
Impact ionization in nonuniformly heated silicon p+–n–n+ and n+–p–p+ structures
Creators
- 1. Russian Academy of Sciences, Amirkhanov Institute of Physics, Dagestan Scientific Center (Russian Federation)
Description
Experimental results on the effects of changes in the impact-ionization current in silicon diffusion p+–n–n+ and n+–p–p+ structures upon nonuniform heating are presented. It is shown that the revealed effects are associated with the transformation of band energy levels caused by thermoelastic stresses of the structures.
Additional details
Identifiers
Publishing Information
- Journal Title
- Semiconductors
- Journal Volume
- 50
- Journal Issue
- 4
- Journal Page Range
- p. 462-465
- ISSN
- 1063-7826
- CODEN
- SMICES
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48094158
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BAND THEORY; DIFFUSION; ELECTRIC CURRENTS; ELECTRONIC STRUCTURE; ENERGY LEVELS; HEATING; IONIZATION; P-N JUNCTIONS; SILICON; STRESSES; THERMOELASTICITY
- Descriptors DEC
- CURRENTS; ELASTICITY; ELEMENTS; MECHANICAL PROPERTIES; SEMICONDUCTOR JUNCTIONS; SEMIMETALS
Optional Information
- Copyright
- Copyright (c) 2016 Pleiades Publishing, Ltd.