Published December 1, 1984 | Version v1
Journal article

Substrate signal suppression in Raman spectra of sputter deposited TiO2 films

Creators

  • 1. Pacific Northwest Laboratory, Richland, Washington 99352

Description

Polarized Raman scattering measurements of thin sputter deposited TiO2 films on silica substrates are reported and demonstrate supression of substrate Raman scattering when one specific component of the scattered radiation is analyzed

Additional details

Publishing Information

Journal Title
J. Chem. Phys.
Journal Volume
81
Journal Issue
11
Series
J. Chem. Phys.
Journal Page Range
5211-5213
ISSN
0021-9606

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
16049660
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
COATINGS; FILMS; POLARIZATION; RAMAN SPECTRA; SILICON OXIDES; SUBSTRATES; TITANIUM OXIDES
Descriptors DEC
CHALCOGENIDES; OXIDES; OXYGEN COMPOUNDS; SILICON COMPOUNDS; SPECTRA; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS