Published May 3, 1999 | Version v1
Journal article

Analysis of bonding and d-electron count in the transition-metal carbides and transition-metal-silicide carbides with discrete linear M-C-M units (M = Cr, Fe, Re) by electronic structure calculations

  • 1. North Carolina State Univ., Raleigh, NC (United States). Dept. of Chemistry

Description

Electronic structures of the silicide carbides Tm2Fe2Si2C, Th2Re2Si2C, and ThFe2SiC and the carbide Ho2Cr2C3 were calculated, using the extended Hueckel tight binding method, to probe the d-electron counts of their transition metal atoms M (Cr, Fe, Re) the bonding of their linear M-C-M (M = Cr, Fe, Re) units. The nature of the short interlayer X hor-ellipsis X (X = C, Si) bonds in Tm2Fe2Si2C, Th2Re2Si2C, and Ho2Cr2C3 was also examined. The study shows that the M-C bonds of the M-C-M units exist as double bonds. There is significant bonding in the interlayer Si hor-ellipsis Si contacts of the silicide carbides R2M2Si2C (M = Fe, Re). The transition-metal atoms exist as d10 ions in Tm2Fe2Si2C and Th2Re2Si2C. The d-electron count is slightly lower than d10 in ThFe2SiC and close to d5 in Ho2Cr2C3

Additional details

Publishing Information

Journal Title
Inorganic Chemistry
Journal Volume
38
Journal Issue
9
Journal Page Range
p. 2204-2210
ISSN
0020-1669
CODEN
INOCAJ

Optional Information