Published November 2021 | Version v1
Journal article

Coulomb drag by injected ballistic carriers in graphene n+-i-n-n+ structures. Doping and temperature effects

  • 1. Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow, 117105 (Russian Federation)
  • 2. Research Institute of Electrical Communication, Tohoku University, Sendai, 980-8577 (Japan)
  • 3. Department of Computer Science and Engineering, University of Aizu, Aizu-Wakamatsu, 965-8580 (Japan)
  • 4. Department of Electrical Engineering, University at Buffalo, SUNY, Buffalo, New York, 14260 (United States)
  • 5. Department of Electrical, Computer and Systems Engineering, Rensselaer Polytechnic Institute, Troy, New York, 12180 (United States)

Description

The Coulomb carrier drag effect in lateral n+-i-n-n+ graphene diodes and field-effect transistors with the injection of ballistic electrons into the n-region are evaluated. Calculating the drag factor determining the amplification of the injected current, its dependence on the structural parameters, carrier Fermi energy in the n-region, and temperature is found. As demonstrated, the drag factor exhibits a maximum in certain values of the Fermi energy (i.e., the gate voltage and density of the remote donors) and the temperature. The parameter determining the shape of the current-voltage characteristics (monotonous or S shaped) is also calculated. The obtained results can be used for the optimization of the structures under consideration for different devices, in particular, voltage- and current-driven switches, frequency multipliers, and terahertz emitters. (© 2021 Wiley‐VCH GmbH)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssa.202100535

Additional details

Identifiers

Publishing Information

Journal Title
Physica Status Solidi. A, Applications and Materials Science (Online)
Journal Volume
218
Journal Issue
21
Journal Page Range
p. 1-7
ISSN
1862-6319
CODEN
PSSABA

Optional Information

Notes
AID: 2100535