Published May 2003 | Version v1
Journal article

Ion current on the inner surface of a pipe by plasma-based ion implantation and deposition

Description

Four ring-probes were pasted on the inner surface of a pipe via an insulator sheet and the ion current was separately measured at each position by applying a negative pulse voltage in order to obtain the current distribution on the inner wall of the pipe, which was immersed in a cathodic arc plasma with a current of 80 A dc produced in a nitrogen gas at a pressure of 8 Pa. The probe current inside the pipe decreases rapidly, because the ion sheath thickness increases with time to arrive at the center of the pipe, which causes extinction of the plasma during the application of the pulse voltage to the pipe. Not only multiple setting of the arc sources but also the operation of a high frequency with a short pulse duration are necessary to realize a uniform treatment by a cathodic arc plasma-based ion implantation and deposition

Additional details

Identifiers

PII
S0168583X03008553;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
206
Journal Issue
1-4
Journal Page Range
p. 813-816
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
13. international conference on ion beam modification of materials
Dates
1-6 Sep 2002
Place
Kobe (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
Egypt
INIS RN
35049564
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
DEPOSITION; DISTRIBUTION; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRICAL INSULATORS; ION IMPLANTATION; IONS; PIPES; PLASMA; PULSES; THICKNESS; TUBES
Descriptors DEC
CHARGED PARTICLES; CURRENTS; DIMENSIONS; ELECTRICAL EQUIPMENT; EQUIPMENT; TUBES

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.