Published July 1975
| Version v1
Journal article
Degradation in injection lasers
Description
The climb networks to be expected in an injection laser through electromigration and thermomigration are considered. It is shown that a model involving electromigration and dislocation pipe diffusion can explain the experimental results. It is predicted that thermomigration may be important in optically pumped devices. It is further shown that elastic strain, per se, cannot be responsible for the degradation. Where numerical reduction is appropriate, parameters of the GaAs-Ga/sub 1-x/Al/sub x/As system are used. The activation energy for pipe diffusion in GaAs is estimated to be 0.75 eV and the process is believed to be controlled by the diffusion of arsenic vacancies
Additional details
Additional titles
- Augmented title (English)
- GaAs-GaAlAs
Identifiers
Publishing Information
- Journal Title
- IEEE Journal of Quantum Electronics
- Journal Volume
- 11
- Journal Issue
- 7
- Series
- IEEE J. Quant. Electron.
- Journal Page Range
- 556-561
- ISSN
- 0018-9197
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 7237405
- Subject category
- S42: ENGINEERING;
- Descriptors DEI
- ALUMINIUM ARSENIDES; EFFICIENCY; ELECTROPHORESIS; ENERGY LOSSES; GALLIUM ARSENIDES; PERFORMANCE; SEMICONDUCTOR LASERS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; AMPLIFIERS; ARSENIC COMPOUNDS; ARSENIDES; GALLIUM COMPOUNDS; LASERS; SEMICONDUCTOR DEVICES; SOLID STATE LASERS
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent