Published July 1975 | Version v1
Journal article

Degradation in injection lasers

  • 1. IBM Thomas J. Watson Research Center, Yorktown Heights, NY

Description

The climb networks to be expected in an injection laser through electromigration and thermomigration are considered. It is shown that a model involving electromigration and dislocation pipe diffusion can explain the experimental results. It is predicted that thermomigration may be important in optically pumped devices. It is further shown that elastic strain, per se, cannot be responsible for the degradation. Where numerical reduction is appropriate, parameters of the GaAs-Ga/sub 1-x/Al/sub x/As system are used. The activation energy for pipe diffusion in GaAs is estimated to be 0.75 eV and the process is believed to be controlled by the diffusion of arsenic vacancies

Additional details

Additional titles

Augmented title (English)
GaAs-GaAlAs

Identifiers

Publishing Information

Journal Title
IEEE Journal of Quantum Electronics
Journal Volume
11
Journal Issue
7
Series
IEEE J. Quant. Electron.
Journal Page Range
556-561
ISSN
0018-9197

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7237405
Subject category
S42: ENGINEERING;
Descriptors DEI
ALUMINIUM ARSENIDES; EFFICIENCY; ELECTROPHORESIS; ENERGY LOSSES; GALLIUM ARSENIDES; PERFORMANCE; SEMICONDUCTOR LASERS
Descriptors DEC
ALUMINIUM COMPOUNDS; AMPLIFIERS; ARSENIC COMPOUNDS; ARSENIDES; GALLIUM COMPOUNDS; LASERS; SEMICONDUCTOR DEVICES; SOLID STATE LASERS

Optional Information

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