Obtention of TiO2 thin films by laser ablation

The thin films of TiO2 have been investigated extensively in the last years, since they have a broad variety of applications, which owing to their less usual chemical, electrical and optical properties. In this work are presented the obtained results to deposit TiO2 thin films over glass substrates utilizing the Laser ablation technique. It has been deposited thin films at different substrate temperatures and different oxygen pressures, with the purpose to study the influence of these deposit parameters in the structural characteristics of the obtained films. The structural characterization was realized through Raman spectroscopy and X-ray diffraction (XRD), the superficial morphology was verified by Scanning Electron Microscopy (SEM). The results show that the obtained films were TiO2 in rutile phase, getting this with the substrates at low temperature, its morphology shows a soft surface with some sprinkling particles and a good adherence. (Author)