Identification of the formation phases of filamentary damage induced by nanosecond laser pulses in bulk fused silica
- 1. College of Optoelectronic Science and Engineering, National University of Defense Technology, Changsha 410073 (China)
- 2. Aix Marseille University, CNRS, LP3 UMR 7341, Marseille 13288 (France)
- 3. State Key Laboratory of High Performance Computing, National University of Defense Technology, Changsha 410073 (China)
Description
Employing a pump-probe polarization-based two-frame shadowgraphy setup, the formation of filamentary damage induced in bulk fused silica by a nanosecond pulse at 1064 nm is investigated with a picosecond probe. Three different phases are exhibited in the damage experiments. The first phase is the formation of a micrometric plasma channel along the laser direction during the beginning of the pulse likely caused by multi-photon ionization. This channel exhibits growth during ∼400 ps, and the newly grown plasma is discrete. Then, during the end of the pulse, this channel evolves into a tadpole-like morphology showing an elliptical head upstream the laser flux followed by a thin tail. This observed asymmetry is attributed to shielding effects caused by both the plasma and hot modified silica. Once the damage shows its almost final morphology, a last phase consists in the launch of a pressure wave enlarging it after the laser pulse. The physical mechanisms that might be involved in the formation of plasma channels are discussed. The experimental data are first confronted to the moving breakdown model which overestimates the filamentary damage length. Finally, taking into account the temporal shape of the laser pulses, the coupling between Kerr-induced self-focusing and stimulated Brillouin scattering is discussed to interpret the observations
Additional details
Identifiers
- DOI
- 10.1063/1.4930942;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 107
- Journal Issue
- 11
- Journal Page Range
- p. 111101-111101.5
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47052044
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ASYMMETRY; BREAKDOWN; BRILLOUIN EFFECT; DAMAGE; LASERS; MORPHOLOGY; MULTI-PHOTON PROCESSES; PLASMA; PULSES; SHAPE; SILICA
- Descriptors DEC
- COHERENT SCATTERING; MINERALS; OXIDE MINERALS; SCATTERING
Optional Information
- Notes
- (c) 2015 AIP Publishing LLC