Published 1993 | Version v1
Book

Potential ceramics processing applications with high-energy electron beams

  • 1. Mission Research Corp., Albuquerque, NM (United States)
  • 2. Sandia National Lab., Albuquerque, NM (United States)

Description

High-energy, high-current electron beams may offer unique features for processing of ceramics that are not available with any other heat source. These include the capability to instantaneously heat to several centimeters in depth, to preferentially deposit energy in dense, high-z materials, to process at atmospheric pressures in air or other gases, to have large control over heating volume and heating rate, and to have efficient energy conversion. At a recent workshop organized by the authors to explore opportunities for electron beam processing of ceramics, several applications were identified for further development. These were ceramic joining, fabrication of ceramic powders, and surface processing of ceramics. It may be possible to join ceramics by either electron-beam brazing or welding. Brazing with refractory metals might also be feasible. The primary concern for brazing is whether the braze material can wet to the ceramic when rapidly heated by an electron beam. Raw ceramic powders, such as silicon nitride and aluminum nitride, which are difficult to produce by conventional techniques, could possibly be produced by vaporizing metals in a nitrogen atmosphere. Experiments need to be done to verify that the vaporized metal can fully react with the nitrogen. By adjusting beam parameters, high-energy beams can be used to remove surface flaws which are often sites of fracture initiation. They can also be used for surface cleaning. The advantage of electron beams rather than ion beams for this application is that the heat deposition can be graded into the material. The authors will discuss the capabilities of beams from existing machines for these applications and discuss planned experiments

Part of:
IEEE International conference on plasma science: Conference record--Abstracts

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (United States)
ISBN
0-7803-1360-7
Imprint Title
IEEE International conference on plasma science. Conference record - Abstracts
Imprint Pagination
250 p.
Journal Page Range
p. 117.
ISSN
0730-9244

Conference

Title
20. IEEE international conference on plasma sciences.
Dates
7-9 Jun 1993.
Place
Vancouver (Canada).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
25014120
Subject category
S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CERAMICS; ELECTRON BEAM WELDING; ELECTRON BEAMS; EVAPORATION; EXPERIMENT PLANNING; FABRICATION; SURFACE CLEANING; SURFACE TREATMENTS
Descriptors DEC
BEAMS; CLEANING; JOINING; LEPTON BEAMS; PARTICLE BEAMS; PHASE TRANSFORMATIONS; PLANNING; SURFACE FINISHING; WELDING

Optional Information

Secondary number(s)
CONF-930652--.