Published March 2006 | Version v1
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Preparation of Ta Te2 thin films by laser ablation

  • 1. Atomic Energy Commission, Damascus (Syrian Arab Republic), Dept. of Physics
  • 2. Atomic Energy Commission, Damascus (Syrian Arab Republic), Dept. of Chemistry

Description

The laser ablation system consisting of a vacuum chamber and Nd-YAG laser has been built for deposition TaTe2 on three different substrates (Silicon, glass, and Aluminium). The surface topography of the prepared thin films has been studied by atomic force microscopy (AFM). TaTe2 powder was characterized by using x-ray diffraction. The crystallinity of the thin films was examined by x-ray diffraction (XRD). The results show no peaks corresponding TaTe2, but there are some indications to the Ta3N5. (author)

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Available from INIS in electronic form

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Additional details

Publishing Information

Imprint Pagination
14 p.
Report number
AECS-PH/RRE--160

Optional Information

Notes
9 refs., 9 figs., 2 tabs.