Published November 28, 2014 | Version v1
Journal article Metadata-only

Reactive magnetron sputtering model at making Ti-TiOx coatings

Creators

  • 1. Kazan (Volga Region) Federal University, 18 Kremljovskaja str., Kazan 420008 (Russian Federation)

Description

Mathematical model of reactive magnetron sputtering for plant VU 700-D is described. Approximating curves for experimental current-voltage characteristic for two gas input schemas are shown. Choice of gas input schema influences on model parameters (mainly on pumping speed). Reactive magnetron sputtering model allows develop technology of Ti - TiOx coatings deposition without changing atmosphere and pressure in vacuum chamber

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/567/1/012027

Additional details

Identifiers

DOI
10.1088/1742-6596/567/1/012027;

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
567
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
6. scientific technical conference on Low-temperature plasma during the deposition of functional coatings
Dates
4-7 Nov 2014
Place
Kazan (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47021901
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
APPROXIMATIONS; ATMOSPHERES; COATINGS; DEPOSITION; DIAGRAMS; MAGNETRONS; MATHEMATICAL MODELS; PUMPING; SPUTTERING; TITANIUM; TITANIUM OXIDES; VELOCITY
Descriptors DEC
CALCULATION METHODS; CHALCOGENIDES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; INFORMATION; METALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS