X-PEEM/NEXAFS and AFM of polypyrrole and copper micro-patterns on insulating fluoropolymer substrates

Micro-patterns (80 μm and 10 μm) of copper and semi-conducting polypyrrole on insulating fluorinated ethylene propylene substrates were characterized using synchrotron-based X-ray Photoemission Electron Microscopy (X-PEEM), Near Edge X-ray Absorption Fine Structure (NEXAFS), and Atomic Force Microscopy (AFM). Electronic states in the polypyrrole are verified using the NEXAFS data, and sample degradation upon irradiation is addressed. X-PEEM images show homogeneous distributions of the corresponding elements in the patterns. They do not exhibit dichroic effects and give information about the growth of copper and polypyrrole (i.e. nucleation of Cu, overgrowth of PPy, formation of PPy granules). AFM results are used to verify the topography of the patterns and support the findings on pattern growth