Effect of hydrogen ion bombardment on the characteristics of TiC films formed by the ion beam sputtering method

TiC films were prepared by a dual ion beam sputtering apparatus using combined targets of titanium and graphite. Some of the films were bombarded by hydrogen ions with an energy range of 5-10 keV during deposition. The microhardness of the TiC films was measured by a Knoop hardness tester. Films experiencing hydrogen ion bombardment were 1.5 times harder than films without the bombardment. The atomic composition and the chemical bonding states of the films were analyzed by Auger electron spectroscopy and X-ray photoelectron spectroscopy. Two types of carbon, carbidelike and graphitelike, were observed in the TiC film. In the films with hydrogen ion bombardment, the increased film hardness was attributed to the dominant formation of carbidelike carbon. (orig.)