Published 1975
| Version v1
Book
Anomalous outdiffusion of beryllium implanted into silicon
Creators
- 1. Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung e.V., Freiburg im Breisgau (F.R. Germany). Inst. fuer Angewandte Festkoerperphysik
Description
no abstract available
Additional details
Publishing Information
- Publisher
- Institute of Physics.
- Imprint Place
- London
- ISBN
- 0854981136
- Imprint Title
- Lattice defects in semiconductors, 1974. Invited and contributed papers from the international conference on lattice defects in semiconductors held in Freiburg, 22-25 July 1974
- Imprint Pagination
- p. 474-480.
- Journal Issue
- no. 23
- Series
- Institute of Physics Conference Series.
Conference
- Title
- International conference on lattice defects in semiconductors.
- Dates
- 22 Jul 1974.
- Place
- Freiburg, F.R. Germany.
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 6216172
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; BERYLLIUM; BERYLLIUM IONS; CRYSTAL DEFECTS; DIFFUSION; HIGH TEMPERATURE; IMPURITIES; ION BEAMS; ION IMPLANTATION; PHYSICAL RADIATION EFFECTS; RANGE; SEMICONDUCTOR MATERIALS; SILICON; SPATIAL DISTRIBUTION
- Descriptors DEC
- ALKALINE EARTH METALS; ATOMIC IONS; BEAMS; CHARGED PARTICLES; CRYSTAL STRUCTURE; DISTRIBUTION; ELEMENTS; HEAT TREATMENTS; IONS; METALS; RADIATION EFFECTS; SEMIMETALS