Published March 2007 | Version v1
Journal article

Development of doubly-curved-crystal for focusing of X-rays to micron area

  • 1. Osaka Electro-Communication Univ., Neyagawa, Osaka (Japan)
  • 2. Ayumi Industry Co., Ltd., Himeji, Hyogo (Japan)

Description

Doubly-Curved-Crystal (DCC) for monochromatization and focusing of X-rays, is necessary for the qualitative and quantitative analysis of sub-micron particle by XRF. Si wafers were bent in the suitable curvature for the two directions which cross each other at right angle, and then they were bonded with the bases by different methods, adhesive and anodic bonding. Those DCCs are compared in three dimensional measurements of curved plane, and monochromatization and focusing of X-rays. The focal point size of DCC bonded by anodic bonding, is about 20 μm, which is less than that bonded by the adhesive method. (author)

Additional details

Publishing Information

Journal Title
X-sen Bunseki No Shinpo
Journal Volume
38
Journal Page Range
p. 155-164
ISSN
0911-7806

Optional Information

Notes
5 refs., 11 figs., 1 tab.