An efficient Si light-emitting diode based on an n- ZnO/SiO2-Si nanocrystals-SiO2/p-Si heterostructure
Creators
- 1. Department of Materials Science and Engineering, National Taiwan University, Taipei, Taiwan (China)
Description
Si nanocrystals embedded in a SiO2 matrix and an n-type Al-doped ZnO (ZnO:Al) layer were applied to improve the external quantum efficiency from Si in n- ZnO/SiO2-Si nanocrystals-SiO2/p-Si heterojunction light-emitting diodes (LEDs). The Si nanocrystals were grown by low pressure chemical vapor deposition and the ZnO:Al layer was prepared by atomic layer deposition. The n-type ZnO:Al layer acts as an electron injection layer, a transparent conductive window, and an anti-reflection coating to increase the light extraction efficiency. Owing to the spatial confinement of carriers and surface passivation by the surrounding SiO2, the Si nanocrystals embedded in the SiO2 matrix lead to a significant enhancement of the light emission efficiency from Si. An external quantum efficiency up to 4.3 x 10-4 at the wavelength corresponding to the indirect bandgap of Si was achieved at room temperature.
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/20/44/445202Additional details
Identifiers
- DOI
- 10.1088/0957-4484/20/44/445202;
- PII
- S0957-4484(09)22128-3;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 20
- Journal Issue
- 44
- Journal Page Range
- [7 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42080678
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ALUMINIUM; CHEMICAL VAPOR DEPOSITION; DOPED MATERIALS; ELECTRON BEAM INJECTION; EMISSION; EXTRACTION; HETEROJUNCTIONS; LAYERS; LIGHT EMITTING DIODES; NANOSTRUCTURES; PASSIVATION; QUANTUM EFFICIENCY; SILICON; SILICON OXIDES; SURFACES; TEMPERATURE RANGE 0273-0400 K; ZINC OXIDES
- Descriptors DEC
- BEAM INJECTION; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; EFFICIENCY; ELEMENTS; MATERIALS; METALS; OXIDES; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS; SEMIMETALS; SEPARATION PROCESSES; SILICON COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE; ZINC COMPOUNDS