Corrosion inhibition of copper by 2,5-dimercapto-1,3,4-thiadiazole monolayer in acidic solution
Creators
- 1. Key Laboratory of Eco-environments in Three Gorges Reservoir Region (Ministry of Education), School of Chemistry and Chemical Engineering, Southwest University, Chongqing 400715 (China)
Description
Research highlights: → 2,5-Dimercapto-1,3,4-thiadiazole (DMTD) monolayer was self-assembled on copper surface. → DMTD was assembled on copper surface in a closely parallel manner. → DMTD monolayer is a mixed inhibitor for copper in 0.5 M HCl. - Abstract: 2,5-Dimercapto-1,3,4-thiadiazole (DMTD) monolayer was self-assembled on the fresh copper surface to form protective monolayer against copper corrosion in acidic solution. Its corrosion inhibition was investigated in 0.5 M HCl by cyclic voltammetry, potentiodynamic polarization and electrochemical impedance spectroscopy methods. The results revealed that the DMTD monolayer inhibited the copper corrosion effectively with the optimum self-assembly time of 10 h and the optimum self-assembly concentration of 7.5 mM. Surface observation was performed using scanning electron microscope, contact angle goniometer and Fourier transform infrared spectrometer. The molecular simulation has been used to simulate the adsorption model of DMTD molecule on Cu(1 1 1) surface.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.corsci.2010.12.002Additional details
Identifiers
- DOI
- 10.1016/j.corsci.2010.12.002;
- PII
- S0010-938X(10)00591-3;
Publishing Information
- Journal Title
- Corrosion Science
- Journal Volume
- 53
- Journal Issue
- 3
- Journal Page Range
- p. 1072-1078
- ISSN
- 0010-938X
- CODEN
- CRRSAA
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42080937
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADSORPTION; COPPER; CORROSION; CORROSION INHIBITORS; CORROSION PROTECTION; ELECTROCHEMISTRY; GONIOMETERS; IMPEDANCE; INFRARED SPECTROMETERS; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SIMULATION; SPECTROSCOPY; SURFACES; VOLTAMETRY
- Descriptors DEC
- CHEMICAL REACTIONS; CHEMISTRY; ELECTRON MICROSCOPY; ELEMENTS; MEASURING INSTRUMENTS; METALS; MICROSCOPY; SORPTION; SPECTROMETERS; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.