Published April 26, 2004 | Version v1
Journal article

Writing submicrometric metallic patterns by ultraviolet synchrotron irradiation of nanostructured carbon and TiOx-carbon films

  • 1. Sincrotrone Trieste, S. S. 14 km 163.5, in Area Science Park, I-34012 Basovizza-Trieste (Italy)
  • 2. INFM-Istituto di Fisiologia Generale e Chimica Biologica and CIMAINA, Universita di Milano, via Trentacoste 2, I-20134 Milan (Italy)
  • 3. INFM-Dipartimento di Fisica and CIMAINA, Universita di Milano, via Celoria 16, I-20133 Milan (Italy)
  • 4. INFM-Dipartimento di Fisica, Universita della Calabria, Ponte Bucci, Cubo 33c, I-87036 Arcavacata di Rende, CS (Italy)

Description

Nanostructured carbon and carbon-TiOx films produced by supersonic cluster beam deposition have been characterized by spatially resolved (0.5 μm lateral resolution) photoemission spectroscopy with synchrotron light. We have found that pure and TiOx-containing nanostructured carbon is modified under high flux UV exposure showing the onset of a metallic character near the Fermi level. We have studied the spectroscopic features, the spatial confinement, and the kinetics of this metallization process of the irradiated regions. This effect allows one to write metallic patterns in the TiOx-containing films with a submicrometric resolution and with a fast kinetic

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
84
Journal Issue
17
Journal Page Range
p. 3412-3414
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2004 American Institute of Physics.