Published April 2003 | Version v1
Journal article

Effect of irradiation with low-energy Ar ions on the characteristics of the working and rear sides of single-crystal GaAs substrate

  • 1. Udmurt State University, Krasnoarmeiskaya ul. 71, Izhevsk, 426034 (Russian Federation)
  • 2. Nizhni Novgorod State Technical University, ul. Minina 24, Nizhni Novgorod, 603024 (Russian Federation)

Description

Contactless methods were used to study the characteristics of the front and rear sides of single-crystal GaAs wafers whose rear side was irradiated with low-energy Ar ions. Variations in the optical and photoelectric properties of irradiated and unirradiated sides were detected. A solitonic mechanism for the penetration of defects into the crystal bulk is suggested

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
37
Journal Issue
4
Journal Page Range
p. 448-451
ISSN
1063-7826
CODEN
SMICES

Optional Information

Notes
Translated from Fizika i Tekhnika Poluprovodnikov, ISSN 0015-3222, 37, 465-468 (No. 4, 2003); (c) 2003 MAIK ''Nauka / Interperiodica''.