Published 1985 | Version v1
Journal article

Optimization of conditions for epitaxy layer deposition of PbTesub(x)Sesub(1-x) solid solutions

  • 1. Ivano-Frankovskij Gosudarstvennyj Pedagogicheskij Inst. (Ukrainian SSR)

Description

Optimal conditions for deposition of epitaxy layers of PbTesub(x)Sesub(1-x) solid solutions are determined by the method of ''hot wall'' on clefts (111) of BaF2 crystals for varying compositions (0.0<x<1.0), substrate temperatures (225 deg C <= Tsub(s) <= 325 deg C) and for constant temperatures of evaporation (Tsub(e)=550 deg C) and chambedr walls (Tsub(w)=580 deg C). The charge carrier mobility (μ) and-concentration (n) as well as the ratio y=μ'/h' are chosen as optimization parameters. Regression equations are obtained for a local description of a small region of response surfaces as well as for the whole range of the factor determination

Additional details

Additional titles

Original title (Russian)
Оптимизация условий осаждения эпитаксиальных слоев твердых растворов PbTesub(x)Сесуб(1-x)

Publishing Information

Journal Title
Zavod. Lab.
Journal Volume
51
Journal Issue
5
Series
Zavod. Lab.
Journal Page Range
60-62
ISSN
0321-4265
CODEN
ZVDLA

Optional Information

Notes
For English translation see the journal Industrial Laboratory (USA).