Published August 1, 2015 | Version v1
Journal article

Anomalous Channel Length Dependence of Hot-Carrier-Induced Saturation Drain Current Degradation in n-Type MOSFETs

  • 1. National ASIC System Engineering Technology Research Center, Southeast University, Nanjing 210096 (China)
  • 2. CSMC Technologies Corporation, Wuxi 214028 (China)

Description

The dependencies of hot-carrier-induced degradations on the effective channel length Lch,eff are investigated for n-type metal-oxide-semiconductor field effect transistor (MOSFETs). Our experiments find that, with decreasing Lch,eff, the saturation drain current (Idsat) degradation is unexpectedly alleviated. The further study demonstrates that the anomalous Lch,eff dependence of Idsat degradation is induced by the increasing influence of the substrate current degradation on the Idsat degradation with Lch,eff reducing. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/32/8/088502

Additional details

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
32
Journal Issue
8
Journal Page Range
[3 p.]
ISSN
0256-307X
CODEN
CPLEEU

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
48022600
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
CURRENTS; LENGTH; METALS; MOSFET; OXIDES; SATURATION; SEMICONDUCTOR MATERIALS; SUBSTRATES
Descriptors DEC
CHALCOGENIDES; DIMENSIONS; ELEMENTS; FIELD EFFECT TRANSISTORS; MATERIALS; MOS TRANSISTORS; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; TRANSISTORS