Published August 1, 2015
| Version v1
Journal article
Anomalous Channel Length Dependence of Hot-Carrier-Induced Saturation Drain Current Degradation in n-Type MOSFETs
Creators
- 1. National ASIC System Engineering Technology Research Center, Southeast University, Nanjing 210096 (China)
- 2. CSMC Technologies Corporation, Wuxi 214028 (China)
Description
The dependencies of hot-carrier-induced degradations on the effective channel length Lch,eff are investigated for n-type metal-oxide-semiconductor field effect transistor (MOSFETs). Our experiments find that, with decreasing Lch,eff, the saturation drain current (Idsat) degradation is unexpectedly alleviated. The further study demonstrates that the anomalous Lch,eff dependence of Idsat degradation is induced by the increasing influence of the substrate current degradation on the Idsat degradation with Lch,eff reducing. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0256-307X/32/8/088502Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics Letters
- Journal Volume
- 32
- Journal Issue
- 8
- Journal Page Range
- [3 p.]
- ISSN
- 0256-307X
- CODEN
- CPLEEU
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48022600
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- CURRENTS; LENGTH; METALS; MOSFET; OXIDES; SATURATION; SEMICONDUCTOR MATERIALS; SUBSTRATES
- Descriptors DEC
- CHALCOGENIDES; DIMENSIONS; ELEMENTS; FIELD EFFECT TRANSISTORS; MATERIALS; MOS TRANSISTORS; OXYGEN COMPOUNDS; SEMICONDUCTOR DEVICES; TRANSISTORS