Published November 11, 2013
| Version v1
Journal article
Dynamics of iron-acceptor-pair formation in co-doped silicon
Creators
- 1. Calisolar GmbH, Magnusstrasse 11, 12489 Berlin (Germany)
- 2. TU Ilmenau, Institut für Physik, Weimarer Str. 32, 98693 Ilmenau (Germany)
- 3. CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany)
Description
The pairing dynamics of interstitial iron and dopants in silicon co-doped with phosphorous and several acceptor types are presented. The classical picture of iron-acceptor pairing dynamics is expanded to include the thermalization of iron between different dopants. The thermalization is quantitatively described using Boltzmann statistics and different iron-acceptor binding energies. The proper understanding of the pairing dynamics of iron in co-doped silicon will provide additional information on the electronic properties of iron-acceptor pairs and may become an analytical method to quantify and differentiate acceptors in co-doped silicon
Additional details
Identifiers
- DOI
- 10.1063/1.4830227;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 103
- Journal Issue
- 20
- Journal Page Range
- p. 202109-202109.4
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45075275
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BINDING ENERGY; BOLTZMANN STATISTICS; DOPED MATERIALS; IRON; SILICON; THERMALIZATION
- Descriptors DEC
- ELEMENTS; ENERGY; MATERIALS; METALS; SEMIMETALS; SLOWING-DOWN; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2013 AIP Publishing LLC