Published November 11, 2013 | Version v1
Journal article

Dynamics of iron-acceptor-pair formation in co-doped silicon

  • 1. Calisolar GmbH, Magnusstrasse 11, 12489 Berlin (Germany)
  • 2. TU Ilmenau, Institut für Physik, Weimarer Str. 32, 98693 Ilmenau (Germany)
  • 3. CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH, Konrad-Zuse-Str. 14, 99099 Erfurt (Germany)

Description

The pairing dynamics of interstitial iron and dopants in silicon co-doped with phosphorous and several acceptor types are presented. The classical picture of iron-acceptor pairing dynamics is expanded to include the thermalization of iron between different dopants. The thermalization is quantitatively described using Boltzmann statistics and different iron-acceptor binding energies. The proper understanding of the pairing dynamics of iron in co-doped silicon will provide additional information on the electronic properties of iron-acceptor pairs and may become an analytical method to quantify and differentiate acceptors in co-doped silicon

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
103
Journal Issue
20
Journal Page Range
p. 202109-202109.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45075275
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
BINDING ENERGY; BOLTZMANN STATISTICS; DOPED MATERIALS; IRON; SILICON; THERMALIZATION
Descriptors DEC
ELEMENTS; ENERGY; MATERIALS; METALS; SEMIMETALS; SLOWING-DOWN; TRANSITION ELEMENTS

Optional Information

Notes
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