Special corrosion behavior of an inoculant refined Cu-Al-Mn shape memory alloy during electropolishing process
- 1. Key Laboratory for New Type of Functional Materials in Hebei Province, School of Materials Science and Engineering, Hebei University of Technology, Tianjin, 300130 (China)
Description
Highlights: • Inoculant refined CuAlMn SMA exhibits special corrosion behavior in electropolishing. • The corroded surface of the alloy look like a beautiful ink-washing painting. • Stress layers, rather than loosely arranged atoms, are responsible for the corrosion. • This study provides a method to pursue the distribution of inoculant particles. • This study can help us to reveal the refining mechanism of inoculants refined alloys. -- Abstract: The Cu-11.9Al-2.5Mn (wt%) shape memory alloy (SMA) refined by the Cu51Zr14 inoculant exhibits special corrosion behavior in electropolishing process, which makes the surface of the alloy look like a beautiful ink-washing painting. Transmission electron microscope (TEM) observation reveals that this can be ascribed to the stress layers existing near the Cu51Zr14/Cu-Al-Mn interfaces. Fortunately, these stress layers do not disturb the perfect lattice matching relationship between the Cu51Zr14 particle and the Cu-Al-Mn SMA. This study provides a simple and efficient method to pursue the distribution of inoculant particles in the refined alloys and to help us to reveal the refining mechanism.
Additional details
Identifiers
- DOI
- 10.1016/j.matchar.2019.05.026;
- PII
- S1044580319311805;
Publishing Information
- Journal Title
- Materials Characterization
- Journal Volume
- 153
- Journal Page Range
- p. 348-353
- ISSN
- 1044-5803
- CODEN
- MACHEX
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55030903
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALLOYS; ATOMS; CORROSION; ELECTROPOLISHING; REFINING; SHAPE MEMORY EFFECT; SURFACES; TRANSMISSION ELECTRON MICROSCOPY; WASHING
- Descriptors DEC
- CHEMICAL REACTIONS; CLEANING; ELECTROLYSIS; ELECTRON MICROSCOPY; LYSIS; MICROSCOPY; POLISHING; PROCESSING; SURFACE FINISHING
Optional Information
- Copyright
- Copyright (c) 2019 Elsevier Inc. All rights reserved.