Published October 2018 | Version v1
Journal article

Highly sensitive pressure sensors employing 3C-SiC nanowires fabricated on a free standing structure

  • 1. Department of Aeronautics and Astronautic, Stanford University (United States)
  • 2. Queensland Micro- and Nanotechnology Centre, Griffith University, Queensland (Australia)
  • 3. Department of Electrical Engineering, Stanford University (United States)
  • 4. Department of Mechanical Engineering, Aichi Institute of Technology, Toyota (Japan)
  • 5. School of Engineering, Griffith University, Queensland (Australia)

Description

Highlights: • A smart design using stress concentration in nanowires was proposed to enhance the sensitivity of piezoresistive sensors • A numerical analysis model was developed to estimate the amplification gain of the proposed nanowire structure. • A proof-of-concept nanowire-pressure sensor was fabricated using focused ion beam and laser engraving • The developed sensor showed significant 3-fold enhancement in the sensitivity in comparison to conventional structures This paper presents highly sensitive pressure sensors using piezoresistive nanowires. Our approach is based on nanowires locally fabricated on free standing structures with a high strain concentration. This strain concentration phenomenon amplifies the strain induced into nano-scaled sensing elements while the bulk materials are still at small strain regime, therefore enhancing the sensitivity of the sensors. For proof of concept, we utilized SiC nanowire fabricated using focused ion beam from an epitaxially grown thin film. Experimental results show significant 3-fold enhancement in the sensitivity in comparison to conventional structures, which is in good agreement with analytical modeling and numerical simulation. The proposed design shows potential for the development of miniaturized highly sensitive but robust nano mechanical-sensors.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matdes.2018.06.031

Additional details

Identifiers

DOI
10.1016/j.matdes.2018.06.031;
PII
S0264127518304994;

Publishing Information

Journal Title
Materials and Design
Journal Volume
156
Journal Page Range
p. 16-21
ISSN
0264-1275
CODEN
MADSD2

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53008380
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
COMPUTERIZED SIMULATION; CONCENTRATION RATIO; ION BEAMS; LASERS; NANOWIRES; NUMERICAL ANALYSIS; SENSITIVITY; SENSORS; SILICON CARBIDES; STRAINS; THIN FILMS
Descriptors DEC
BEAMS; CARBIDES; CARBON COMPOUNDS; DIMENSIONLESS NUMBERS; FILMS; MATHEMATICS; NANOSTRUCTURES; SILICON COMPOUNDS; SIMULATION

Optional Information

Copyright
Copyright (c) 2018 Elsevier Ltd. All rights reserved.