Competitive effects of film thickness and growth rate in spray pyrolytically deposited fluorine-doped tin dioxide films
Creators
- 1. Solcoat Consultants, 101, Saket Apartment, Shreeman Parisar, Vitthal Mandir Road, Karve Nagar, PUNE - 411052 (India)
- 2. Department of Physics, University of Pune, Pune-411007 (India)
Description
Here we report efforts to understand the competitive roles of film thickness (up to ∼ 650 nm) and growth rate (up to ∼ 190 nm/min) in spray pyrolytically deposited fluorine-doped tin dioxide films. This was achieved by varying the time of deposition and/or the precursor concentration. Film properties were investigated using X-ray diffraction technique and Hall effect measurements. The thickness evolution involved textured growth along [200] orientation followed by a secondary prominence of [110] and [101] orientations. The growth rate induced effects accelerated this change. The carrier concentration and carrier mobility showed that the [200] oriented growth is technologically advantageous and can be obtained using a wider growth rate range ∼ 50-130 nm/min.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2010.02.020Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2010.02.020;
- PII
- S0040-6090(10)00202-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 518
- Journal Issue
- 17
- Journal Page Range
- p. 4868-4873
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42059937
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CARRIER MOBILITY; COATINGS; DEPOSITION; DOPED MATERIALS; FLUORINE; HALL EFFECT; ORIENTATION; PRECURSOR; PYROLYSIS; SPRAYS; THIN FILMS; TIN OXIDES; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELEMENTS; FILMS; HALOGENS; MATERIALS; MOBILITY; NONMETALS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; THERMOCHEMICAL PROCESSES; TIN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.