Published July 2008 | Version v1
Journal article

An electrochemical dopamine sensor with a CMOS detection circuit

  • 1. Institute of Electronics Engineering, National Tsing Hua University, Hsinchu, Taiwan (China)
  • 2. Department of Biological Science and Technology, National Chiao Tung University, Hsinchu, Taiwan (China)

Description

This paper presents the integration of interdigitated microelectrodes and a CMOS circuit for electrochemical sensing of the neurotransmitter dopamine. Gold electrodes with a gap of 3 µm are fabricated by the lift-off technique. The CMOS sensing circuit has a current gain of 10, an integrating capacitor of 4 pF, and a measured dynamic range of 60 dB. The applied reduction and oxidation potentials are determined by voltammetry at about −0.2 V and 0.6 V, respectively. The measured collection efficiency can reach up to 84%. The produced oxidation current with respect to dopamine concentration averages 0.44 nA µM−1

Availability note (English)

Available from http://dx.doi.org/10.1088/0960-1317/18/7/075028

Additional details

Identifiers

DOI
10.1088/0960-1317/18/7/075028;
PII
S0960-1317(08)73671-4;

Publishing Information

Journal Title
Journal of Micromechanics and Microengineering. Structures, Devices and Systems
Journal Volume
18
Journal Issue
7
Journal Page Range
[7 p.]
ISSN
0960-1317
CODEN
JMMIEZ