Published February 2001 | Version v1
Journal article

Formation of radiation defects in high-purity silicate glasses in dependence on dopants and UV radiation sources

  • 1. Friedrich-Schiller-Univ. Jena (Germany). Otto-Schott-Inst. fuer Glaschemie
  • 2. Schott Glaswerke, Mainz (Germany)

Description

The radiation-resistance of high-purity glasses (∼1 ppm iron) of the type BK7 trademark, DURAN trademark and lead silicate (PbS) with high transmission in the UV region was studied. The investigations were concentrated on the influence of UV-absorbing dopants on defect generation. These were refining agents, As2O3, Sb2O3, NaCl, and TiO2 as solarization suppressing agent for the visible range in BK7, and small impurities of tin ions in DURAN. The samples were irradiated with UV lamps and excimer lasers (XeCl-308 nm, KrF-248 nm, ArF-193 nm). The defect generation increases with the use of refining agents in BK7 and with the presence of small amounts of Sn2+ in DURAN. The influence of TiO2 on the defect generation strongly depends on the radiation source. A model explaining the defect generation in these glasses is suggested. (orig.)

Additional details

Publishing Information

Journal Title
Glass Science and Technology (Frankfurt)
Journal Volume
74
Journal Issue
2
Journal Page Range
p. 23-31
ISSN
0946-7475
CODEN
GSTEEX

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
32023077
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DAMAGE; DEFECTS; DOPED MATERIALS; GLASS; PHYSICAL RADIATION EFFECTS; SILICATES; ULTRAVIOLET RADIATION
Descriptors DEC
ELECTROMAGNETIC RADIATION; MATERIALS; OXYGEN COMPOUNDS; RADIATION EFFECTS; RADIATIONS; SILICON COMPOUNDS