Published 1992 | Version v1
Miscellaneous Metadata-only

Low-energy ion bombardment during Cr:C films deposition from vapor phase: effects on microstructure and phase state

Creators

  • 1. Kharkov Institute of Physics and Technology (Ukraine)

Description

Short communications only

Part of:
Radiation processing: conference abstracts

Additional details

Publishing Information

Imprint Title
Radiation processing: conference abstracts
Imprint Pagination
368 p.
Journal Page Range
p. 311.

Conference

Title
8. international meeting on radiation processing.
Dates
13-18 Sep 1992.
Place
Beijing (China).

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
25066039
Subject category
S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference, No Abstract, Non-conventional Literature
Descriptors DEI
CORROSION RESISTANCE; DISPERSION HARDENING; EV RANGE 100-1000; FILM CONDENSATION; FILMS; ION EMISSION; ION PLASMA WAVES; METALS; MICROSTRUCTURE; NONMETALS; PHASE TRANSFORMATIONS; PLASMA ARC SPRAYING; RADIATION EFFECTS; TEMPERATURE DEPENDENCE; VACUUM COATING; VAPORS; WEAR RESISTANCE
Descriptors DEC
CRYSTAL STRUCTURE; DEPOSITION; ELEMENTS; EMISSION; ENERGY RANGE; EV RANGE; FLUIDS; GASES; HARDENING; ION WAVES; MECHANICAL PROPERTIES; PLASMA WAVES; SPRAY COATING; SURFACE COATING; VAPOR CONDENSATION

Optional Information