Published April 1, 2016
| Version v1
Journal article
Temperature-dependence of Threshold Current Density-Length Product in Metallization Lines: A Revisit
Creators
- 1. Universitas Indonesia, Depok 16424 Indonesia (Indonesia)
- 2. University of Texas at Arlington, Texas 76019 (United States)
Description
One of the important phenomena in Electromigration (EM) is Blech Effect. The existence of Threshold Current Density-Length Product or EM Threshold has such fundamental and technological consequences in the design, manufacture, and testing of electronics. Temperature-dependence of Blech Product had been thermodynamically established and the real behavior of such interconnect materials have been extensively studied. The present paper reviewed the temperature-dependence of EM threshold in metallization lines of different materials and structure as found in relevant published articles. It is expected that the reader can see a big picture from the compiled data, which might be overlooked when it was examined in pieces. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/710/1/012044Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 710
- Journal Issue
- 1
- Journal Page Range
- [12 p.]
- ISSN
- 1742-6596
Conference
- Title
- 4. international conference on science and engineering in mathematics, chemistry and physics
- Acronym
- ScieTech 2016
- Dates
- 30-31 Jan 2016
- Place
- Bali (Indonesia)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49005768
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CURRENT DENSITY; DESIGN; ELECTROPHORESIS; LENGTH; REVIEWS; TEMPERATURE DEPENDENCE; TESTING; THERMODYNAMICS; THRESHOLD CURRENT
- Descriptors DEC
- CURRENTS; DIMENSIONS; DOCUMENT TYPES; ELECTRIC CURRENTS