Relative sputtering yields and quantitative surface analysis by Auger spectroscopy

During the past few years, the qualitative analysis of surfaces by Auger electron spectroscopy has become an accepted analytical technique. With all analytical techniques, however, the ultimate goal is to obtain quantitative information. This paper presents data on the relative sputtering yield of several elements obtained by studying the surface composition of alloy systems (Cr--Pd, Ag--Pd, Cu--Pd, Mn--Ag--Pd, and Nb--U) varying in composition from a few to roughly fifty atomic percent. The reported measurements were taken while sputtering after the alloy surface had reached a steady state composition. Peak heights were referenced to in situ standards of the pure alloy components. Multiple determinations were carried out over a period of several weeks in order to check the reproducibility and to estimate the standard deviation in the data. This information was used to obtain uncertainty limits for the calculated sputtering yields