Statistical characteristics of fluctuation of heights, surface roughness and fractal properties of Cu thin films

To investigate the surface roughness, and get some information about statistical behaviour of Cu thin films and knowledge about morphology and fractal characteristics of them, copper thin films have been deposited on glass substrate by dc magnetron sputtering method. In different deposition rate (0.4-2.5 nm/sec), effect of this parameter on surface roughness has been investigated. By AFM studies interface width (W or surface roughness) and structure function S2(l) as well as different moment of structure function Sq(l) and correlation length also have been investigated for various experimental conditions. Fractal properties of them have been studied too and height distribution satisfied Gaussian distribution function