Published May 1, 2009 | Version v1
Journal article

Molecular dynamics simulations of argon cluster impacts on a nickel film surface

  • 1. Thin Film Technology Center, Department of Optics and Photonics, National Central University, Chung-Li 320, Taiwan (China)

Description

In this study we probe the surface phenomena that occur on nickel thin films after argon cluster impacts by performing several simulations using various energies. The simulations are carried out based on a molecular dynamics (MD) approach. The argon cluster consists of 353 atoms with energies ranging from 1 keV to 3.0 keV. The simulation results show that when the incident energy is 1 keV, the surface retains its smoothness after impact although a slight thermal effect appears near the surface beneath the impact area. Increasing the argon cluster energy to 2 keV causes the atoms in the film to shift slightly under impact and a small hillock appears on the film surface after impact. When the cluster energy increases to 3 keV, a hemispherical crater will appear on the film surface after impact. In addition, a shock wave is generated within the film due to the impact, which propagates toward to the substrate in a hemispherical shape. These shock wave related phenomena are difficult to probe experimentally on an atomic level however molecular dynamics simulations are a suitable tool for investigating the shock wave phenomena in thin film.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2009.01.056

Additional details

Identifiers

DOI
10.1016/j.nimb.2009.01.056;
PII
S0168-583X(09)00103-7;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
267
Journal Issue
8-9
Journal Page Range
p. 1428-1431
ISSN
0168-583X
CODEN
NIMBEU

Conference

Title
16. international conference on ion beam modification of materials
Dates
31 Aug - 5 Sep 2008
Place
Dresden (Germany)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.