Published November 1970
| Version v1
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Effects of electric and magnetic fields, substrate temperature, pressure, and evaporation rate on the nucleation, structure, and residual properties of vapor deposited metal films. Annual progress report No. 2, April 1, 1970--March 31, 1971
Description
no abstract available
Availability note (English)
MF available from INIS under the Report Number.
Files
Restricted
The record is publicly accessible, but files are restricted to users with access.
Additional details
Publishing Information
- Imprint Pagination
- 34 p.
- Report number
- USC--113-P-22-2
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 3021470
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COBALT; ELECTRIC FIELDS; EPITAXY; EVAPORATION; FILMS; INDIUM; ION MICROSCOPY; IRON; MAGNETIC FIELDS; METALS; NICKEL; PALLADIUM; PRESSURE DEPENDENCE; TEMPERATURE DEPENDENCE; TIME DEPENDENCE; TUNGSTEN; VAPOR PLATING
- Descriptors DEC
- DEPOSITION; ELEMENTS; MICROSCOPY; PHASE TRANSFORMATIONS; PLATING; SURFACE COATING; TRANSITION ELEMENTS
Optional Information
- Secondary number(s)
- USCEE--399.