Published September 2007 | Version v1
Journal article

Fabrication of hollow nanoclusters by ion implantation

  • 1. Department of Physics, Wuhan University, Wuhan 430072 (China)
  • 2. Key Laboratory of Acoustic and Photonic Materials and Devices of Ministry of Education, Wuhan University, Wuhan 430072 (China)

Description

Ag ions with four kinds of energies were implanted into silica to doses of 5 x 1016 and 1 x 1017 ions/cm2, respectively. Hollow Ag nanoclusters were observed in the 1 x 1017 Ag+ ions/cm2 implanted samples with energies of 150 and 200 keV. The evolution of hollow nanoclusters during annealing was carried out by in situ transmission electron microscopy observation. The energy dependence for the formation of hollow nanoclusters is studied. A potential mechanism for the formation of irradiation-induced nanovoids in nanoclusters is discussed

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nimb.2007.05.024

Additional details

Identifiers

DOI
10.1016/j.nimb.2007.05.024;
PII
S0168-583X(07)01156-1;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
Journal Volume
262
Journal Issue
2
Journal Page Range
p. 201-204
ISSN
0168-583X
CODEN
NIMBEU

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
39049137
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ANNEALING; ENERGY DEPENDENCE; FABRICATION; ION IMPLANTATION; KEV RANGE 100-1000; NANOSTRUCTURES; RADIATION DOSES; SILICA; SILVER IONS; TRANSMISSION ELECTRON MICROSCOPY; VOIDS
Descriptors DEC
CHARGED PARTICLES; DOSES; ELECTRON MICROSCOPY; ENERGY RANGE; HEAT TREATMENTS; IONS; KEV RANGE; MICROSCOPY; MINERALS; OXIDE MINERALS

Optional Information

Copyright
Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.