Low-temperature growth of graphene on iron substrate by molecular beam epitaxy
Creators
- 1. Quantum Structures Laboratory, Department of Electrical and Computer Engineering, University of California, Riverside, CA 92521 (United States)
- 2. Irvine Materials Research Institute, University of California, Irvine, CA 92697 (United States)
Description
Graphene has attracted a great deal of interest due to its fascinating properties and a wide variety of potential applications. Several methods have been used to achieve high-quality graphene films on different substrates. However, there have been only a few studies on graphene growth on iron (Fe) and the growth mechanism remains unclear. This paper systematically investigates temperature-dependent growth of graphene on Fe substrate by gas-source molecular beam epitaxy. Two-dimensional (2D), large-area graphene samples were grown on Fe thin films, and characterized by Raman, X-ray photoelectron spectroscopy, X-ray diffraction, optical microscopy, transmission electron microscopy and atomic force microscopy. It is found that graphene flakes can be grown on Fe at a growth temperature as low as 400 °C and the optimized large-area graphene growth temperature is relatively low between 500 °C and 550 °C. The graphene growth on Fe that undergoes the formation and decomposition of iron carbide is discussed. - Highlights: • Temperature-dependent growth of graphene on Fe using MBE is studied. • Graphene is achieved on Fe at a wide growth temperature range and as low as 400 °C. • Graphene growth on Fe is associated with formation and decomposition of iron carbide.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2017.02.057Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2017.02.057;
- PII
- S0040-6090(17)30156-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 627
- Journal Page Range
- p. 39-43
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50023874
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; DECOMPOSITION; GRAPHENE; IRON CARBIDES; MOLECULAR BEAM EPITAXY; OPTICAL MICROSCOPY; SUBSTRATES; TEMPERATURE DEPENDENCE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CARBIDES; CARBON; CARBON COMPOUNDS; CHEMICAL REACTIONS; COHERENT SCATTERING; CRYSTAL GROWTH METHODS; DIFFRACTION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; EPITAXY; FILMS; IRON COMPOUNDS; MICROSCOPY; NONMETALS; PHOTOELECTRON SPECTROSCOPY; SCATTERING; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.