Published April 1995
| Version v1
Journal article
Raman scattering and photoluminescence of porous silicon
Creators
- 1. AN SSSR, Moscow (Russian Federation). Inst. Obshchej Fiziki
- 2. Moskovskij Gosudarstvennyj Univ., Moscow (Russian Federation). Nauchno-Issledovatel'skij Inst. Yadernoj Fiziki
Description
Raman scattering, photoluminescence and optical reflectivity of porous silicon layers prepared under different regimes of electrochemical etching were studied. The dependence of the optical thickness of the porous silicon layers as well as that of photoluminescence and Raman scattering intensities on the duration and current density of anodization was found to be nonmonotonous. It was shown that photoluminescence spectra were independent of the pre-treatment and the character of Raman scattering spectrum variated at the current density exceeding a certain value. 14 refs.; 6 figs
Additional details
Additional titles
- Original title (Russian)
- Комбинационное рассеяние света и фотолюминесценция пористого кремния
Publishing Information
- Journal Title
- Fizika i Tekhnika Poluprovodnikov
- Journal Volume
- 29
- Journal Issue
- 4
- Journal Page Range
- p. 582-589.
- ISSN
- 0015-3222
- CODEN
- FTPPA4
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- Russian Federation
- INIS RN
- 26078938
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- BORON ADDITIONS; ETCHING; FILMS; LAYERS; PHOTOLUMINESCENCE; POROSITY; RAMAN EFFECT; RAMAN SPECTRA; REFLECTION; SILICON; TIME DEPENDENCE; VISIBLE RADIATION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; ELEMENTS; EMISSION; LUMINESCENCE; PHOTON EMISSION; RADIATIONS; SEMIMETALS; SPECTRA