Published April 1995 | Version v1
Journal article

Raman scattering and photoluminescence of porous silicon

  • 1. AN SSSR, Moscow (Russian Federation). Inst. Obshchej Fiziki
  • 2. Moskovskij Gosudarstvennyj Univ., Moscow (Russian Federation). Nauchno-Issledovatel'skij Inst. Yadernoj Fiziki

Description

Raman scattering, photoluminescence and optical reflectivity of porous silicon layers prepared under different regimes of electrochemical etching were studied. The dependence of the optical thickness of the porous silicon layers as well as that of photoluminescence and Raman scattering intensities on the duration and current density of anodization was found to be nonmonotonous. It was shown that photoluminescence spectra were independent of the pre-treatment and the character of Raman scattering spectrum variated at the current density exceeding a certain value. 14 refs.; 6 figs

Additional details

Additional titles

Original title (Russian)
Комбинационное рассеяние света и фотолюминесценция пористого кремния

Publishing Information

Journal Title
Fizika i Tekhnika Poluprovodnikov
Journal Volume
29
Journal Issue
4
Journal Page Range
p. 582-589.
ISSN
0015-3222
CODEN
FTPPA4