A statistical study of resistive switching parameters in Au/Ta/ZrO(Y)/TaO/TiN/Ti memristive devices
Creators
- 1. Departamento de Electrónica y Tecnología de Computadores, Facultad de Ciencias Universidad de Granada, Granada, 18071 (Spain)
- 2. Laboratory of Intellectual Neuromorphic Systems, Lobachevsky State University of Nizhny Novgorod, Nizhny Novgorod, 603022 (Russian Federation)
- 3. Laboratory of Stochastic Multistable Systems, Lobachevsky State University of Nizhny Novgorod, Nizhny Novgorod, 603022 (Russian Federation)
Description
Variability is an inherent property of memristive devices based on the switching of resistance in a simple metal-oxide-metal structure compatible with the standard complementary metal-oxide-semiconductor fabrication process. For each specific structure, the variability should be measured and assessed as both the negative and positive factors for different applications of memristive devices. In this report, it is shown how this variability can be extracted and analyzed for such main parameters of resistive switching as the set and reset voltages/currents and how it depends on the methodology used and experimental conditions. The obtained results should be taken into account in the design and predictive simulation of memristive devices and circuits. (© 2022 The Authors. physica status solidi (a) applications and materials science published by Wiley‐VCH GmbH)
Availability note (English)
Available from: http://dx.doi.org/10.1002/pssa.202200520Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Status Solidi. A, Applications and Materials Science (Online)
- Journal Volume
- 220
- Journal Issue
- 11
- Journal Page Range
- p. 1-9
- ISSN
- 1862-6319
- CODEN
- PSSABA
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 54103084
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COMPUTERIZED SIMULATION; DISTRIBUTION FUNCTIONS; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; FABRICATION; GOLD; MEMORY DEVICES; PHYSICAL VAPOR DEPOSITION; SPUTTERING; SWITCHING CIRCUITS; TANTALUM OXIDES; TIME DEPENDENCE; TITANIUM NITRIDES; YTTRIUM OXIDES; ZIRCONIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; DEPOSITION; ELECTRICAL PROPERTIES; ELECTRONIC CIRCUITS; ELEMENTS; FUNCTIONS; METALS; NITRIDES; NITROGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; REFRACTORY METAL COMPOUNDS; SIMULATION; SURFACE COATING; TANTALUM COMPOUNDS; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; YTTRIUM COMPOUNDS; ZIRCONIUM COMPOUNDS
Optional Information
- Notes
- AID: 2200520