Published June 30, 2009 | Version v1
Journal article

Superhydrophobic polytetrafluoroethylene thin films with hierarchical roughness deposited using a single step vapor phase technique

  • 1. Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611 (United States)
  • 2. Sinmat Incorporated, 2153 SE Hawthorne Road, 129, Gainesville, Florida 32641 (United States)
  • 3. Advanced Material Processing and Analysis Center, University of Central Florida, Orlando, Florida 32816 (United States)

Description

Superhydrophobic polytetrafluoroethylene films with hierarchical surface roughness were deposited using pulse electron deposition technique. We were able to modulate roughness of the deposited films by controlling the beam energy and hence the electron penetration depth. The films deposited at higher beam energy showed contact angle as high as 166o. The scanning electron and atomic force microscope studies revealed clustered growth and two level sub-micron asperities on films deposited at higher energies. Such dual-scale hierarchical roughness and heterogeneities at the water-surface interface was attributed to the observed contact angle and thus its superhydrophobic nature.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2008.12.048

Additional details

Identifiers

DOI
10.1016/j.tsf.2008.12.048;
PII
S0040-6090(08)01626-X;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
517
Journal Issue
16
Journal Page Range
p. 4555-4559
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2008 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.