Published June 5, 2012 | Version v1
Journal article

Preparation and characterization of RF sputtered Ce-V mixed oxide thin films

  • 1. School of Physics, Alagappa University, Karaikudi-630 003 (India)
  • 2. Department of Physics, N. M. S. Sermathai Vasan College, Madurai-625 012 (India)

Description

Cerium-Vanadium mixed oxide thin films were deposited at room temperature by varying RF power in RF magnetron sputtering. The morphology and structural features were studied by taking FESEM and XRD and optical properties were analyzed by taking transmittance and absorption spectra. The crystalline film shows orthorhombic CeVO3 phase and the observed grain size varies from 89.4nm to 208.7nm. The transmission increases and the absorption edge at 330nm is blue shifted with increase in RF power. The optical band gap is found to increase from 1.59 to 1.94eV. The PL spectra shows blue shift in the emission peak centered at a wavelength of 495nm with increase in RF power.

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1447
Journal Issue
1
Journal Page Range
p. 633-634
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
56. DAE solid state physics symposium 2011
Dates
19-23 Dec 2011
Place
Kattankulathur, Tamilnadu (India)

Optional Information

Notes
(c) 2012 American Institute of Physics