Monitoring electrostatically-induced deflection, strain and doping in suspended graphene using Raman spectroscopy
- 1. Université de Strasbourg, CNRS, Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR 7504, F-67000 Strasbourg (France)
Description
Electrostatic gating offers elegant ways to simultaneously strain and dope atomically thin membranes. Here, we report on a detailed in situ Raman scattering study on graphene, suspended over a Si/SiO2 substrate. In such a layered structure, the intensity of the Raman G- and 2D-mode features of graphene are strongly modulated by optical interference effects and allow an accurate determination of the electrostatically-induced membrane deflection, up to irreversible collapse. The membrane deflection is successfully described by an electromechanical model, which we also use to provide useful guidelines for device engineering. In addition, electrostatically-induced tensile strain is determined by examining the softening of the Raman features. Due to a small residual charge inhomogeneity, we find that non-adiabatic anomalous phonon softening is negligible compared to strain-induced phonon softening. These results open perspectives for innovative Raman scattering-based readout schemes in two-dimensional nanoresonators. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/2053-1583/4/1/014004Additional details
Identifiers
Publishing Information
- Journal Title
- 2D Materials
- Journal Volume
- 4
- Journal Issue
- 1
- Journal Page Range
- [7 p.]
- ISSN
- 2053-1583
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50044950
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ELECTROSTATICS; GRAPHENE; INTERFERENCE; MONITORING; RAMAN EFFECT; RAMAN SPECTROSCOPY; READOUT SYSTEMS; RESONATORS; SILICON; SILICON OXIDES; SUBSTRATES; TWO-DIMENSIONAL SYSTEMS
- Descriptors DEC
- CARBON; CHALCOGENIDES; CRYSTAL LATTICES; CRYSTAL STRUCTURE; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; LASER SPECTROSCOPY; NONMETALS; OXIDES; OXYGEN COMPOUNDS; SEMIMETALS; SILICON COMPOUNDS; SPECTROSCOPY