Residual stresses in tungsten vapor deposits

Using circular specimens values and distribution of peripheral residual stresses in deposits of gaseous tungsten of different thickness on a graphite substrate were determined by the Davidenkov method during electrolytic re oval of metal layers. It is established that the thinner is the deposit the lower is the level of arisnng stresses. After annealing at 750 deg C the stresses decrease by approximately 30 %, and annealing at 1500 deg C results in minimum values. It is assumed that the decrease of the stresses after nnealing at 1500 deg C results from the variations in deposit substructure typical for polygonization processes