Published July 11, 2006 | Version v1
Journal article

Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces

  • 1. Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, IL 60208-3108 (United States)

Description

Well controlled and characterized organic functionalization is a necessary precondition for the fabrication of many silicon-based molecular electronic and sensing devices. Of particular interest are organic modifications that incorporate bromine since heavy atoms can be directly interrogated by X-ray radiation and organohalides provide synthetic handles through which more chemically elaborate structures may be covalently bound to silicon. This paper specifically considers the functionalization of hydrogen passivated silicon surfaces with 4-bromostyrene. X-ray photoelectron spectroscopy confirms the reaction of 4-bromostyrene with monohydride Si(1 0 0) and Si(1 1 1) surfaces such that the bromine moiety is preserved on top of the organic adlayer. In addition, ultra-high vacuum scanning tunneling microscopy reveals that the 4-bromostyrene molecules assemble into one-dimensional nanostructures on the Si(1 0 0)-2 x 1:H surface. Overall, these experimental results demonstrate that styrene derivatives serve as effective organic molecules for the chemical functionalization of hydrogen passivated silicon surfaces

Additional details

Identifiers

DOI
10.1016/j.chemphys.2005.12.023;
PII
S0301-0104(06)00015-2;

Publishing Information

Journal Title
Chemical Physics
Journal Volume
326
Journal Issue
1
Journal Page Range
p. 144-150
ISSN
0301-0104
CODEN
CMPHC2

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.