Published October 2021 | Version v1
Journal article

Synergistic effects of surface Lewis Base/Acid and nitrogen defect in MgAl layered double Oxides/Carbon nitride heterojunction for efficient photoreduction of carbon dioxide

  • 1. School of Chemistry and Chemical Engineering, Jiangsu University, 301 Xuefu Road, Zhenjiang 212013 (China)
  • 2. Institute for Energy Research, Jiangsu University, 301 Xuefu Road, Zhenjiang 212013 (China)

Description

Highlights: • 2D/2D MgAl LDO/Nv-CN photocatalysts were designed for CO2RR. • The catalyst exhibits superior photocatalytic CO2RR activity. • The catalysts achieved the CO evolution rate of 20.47 µmol·g−1·h−1. • The synergistic of defects and Lewis sites promote CO2 photoreduction activity. Conversion of CO2 to CO from solar energy on semiconductors is a promising route to renewable energy, but their practicality is limited by the poor adsorption and activation of CO2 on the semiconductor surface and the low utilization of photovoltaic carriers. Here, we construct a MgAl layered double oxide/nitrogen-deficient carbon nitride (MgAl LDO/Nv-CN) nanosheets hybrid by in situ deposition of MgAl layered double hydroxide (MgAl LDH) on Nv-CN nanosheets followed by subsequent calcination. The MgAl LDO serves as the surface-rich Lewis basic sites to effectively enhance adsorption of CO2 and H2O, while the nitrogen defects can enhance the optical absorption of g-C3N4 and improve the charge carrier separation. The optimal MgAl LDO/Nv-CN has high photocatalytic activity for CO2 reduction with a CO generation rate of 20.47 µmol·g−1·h−1 under visible light illumination, which is 6 times higher than that of bulk g-C3N4. Our work highlights the significance of synergy of MgAl LDO Lewis base/acid sites and nitrogen vacancy defects in the design of efficient photocatalysts for CO2 reduction.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2021.150369

Additional details

Identifiers

DOI
10.1016/j.apsusc.2021.150369;
PII
S0169433221014434;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
563
Journal Page Range
vp.
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.