Published 2021 | Version v1
Journal article Metadata-only

Investigation of the influence of plasma source power on the properties of magnetron sputtered Ta2O5 thin films

Creators

  • 1. Laboratoire Temps-Fréquence, Université de Neuchâtel, 2000 Neuchâtel (Switzerland)
  • 2. RhySearch, the Research and Innovation Center in the Alpine Rhine Valley, Werdenbergstrasse 4, 9471 Buchs SG (Switzerland)
  • 3. Evatec Ltd.,, Hauptstrasse 1a, 9477 Trübbach (Switzerland)

Description

To enable the production of sophisticated optical interference coating designs, coatings with very low absorption and stray light losses and excellent layer thickness deposition accuracy are required. The selection and optimization of suitable coating materials and deposition processes are consequently essential. This study investigated the influence of the plasma source power on the optical properties, layer uniformity and stress, scattered light behavior and optical losses of magnetron sputtered Ta2O5 thin films.

Availability note (English)

Available from https://www.epj-conferences.org/articles/epjconf/pdf/2021/09/epjconf_eosam2021_03005.pdf; https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad37

Additional details

Identifiers

URL
https://www.epj-conferences.org/articles/epjconf/pdf/2021/09/epjconf_eosam2021_03005.pdf; https://doaj.org/article/7628a529ba534d1b9e2ff13e8c6aad37;
DOI
10.1051/epjconf/202125503005;

Publishing Information

Journal Title
EPJ. Web of Conferences
Journal Volume
255
Journal Page Range
vp.
ISSN
2100-014X

Conference

Title
EOS Annual Meeting
Acronym
EOSAM 2021
Dates
13-17 Sep 2021
Place
Rome (Italy)

INIS

Country of Publication
France
Country of Input or Organization
France
INIS RN
53102786
Subject category
S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION; COATINGS; DEPOSITION; DESIGN; INTERFERENCE; LAYERS; MAGNETRONS; MATERIALS; OPTICAL PROPERTIES; OPTIMIZATION; PLASMA; TANTALUM OXIDES; THICKNESS; THIN FILMS
Descriptors DEC
CHALCOGENIDES; DIMENSIONS; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; REFRACTORY METAL COMPOUNDS; SORPTION; TANTALUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS