Published November 2, 2009 | Version v1
Journal article

A carrier-based analytic drain current model incorporating velocity saturation for undoped surrounding-gate MOSFETs

  • 1. TSRC, Key Laboratory of Microelectronic Devices and Circuits of Ministry of Education, EECS, Peking University, Beijing 100871 (China)

Description

A carrier-based analytic drain current model including the velocity saturation effect for the undoped surrounding-gate (SRG) MOSFETs is developed in this paper. Based on the previously ideal carrier-based drain current model, the Caughey–Thomas mobility model with an exponent factor n = 2 is applied and integrated into the analytic drain current model development. The validity of the presented model is confirmed by comparisons with three-dimensional (3D) TCAD device simulations for good agreements between the model prediction and numerical simulation on transfer/output characteristics and trans/output-conductance of the SRG MOSFETs are obtained in the whole operation regions from subthreshold to strong inversion and from linear to saturation regions. The symmetry property of the developed drain current model is guaranteed by the exponent factor n = 2 in the Caughey–Thomas model and also further tested, promoting the analog circuit design function of the proposed model

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/24/11/115003

Additional details

Identifiers

DOI
10.1088/0268-1242/24/11/115003;
PII
S0268-1242(09)18263-9;

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
24
Journal Issue
11
Journal Page Range
[8 p.]
ISSN
0268-1242
CODEN
SSTEET

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45010983
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CARRIERS; COMPARATIVE EVALUATIONS; COMPUTERIZED SIMULATION; CURRENTS; DESIGN; EQUIPMENT; MOSFET; SATURATION; VELOCITY
Descriptors DEC
EVALUATION; FIELD EFFECT TRANSISTORS; MOS TRANSISTORS; SEMICONDUCTOR DEVICES; SIMULATION; TRANSISTORS